Time of flight mobility measurements in a-Si:H grown under controlled-energy ion-bombardment
- 1 May 1996
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 198-200, 300-303
- https://doi.org/10.1016/0022-3093(95)00691-5
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- Influence on the transport properties of the deposition temperature of a-Si:H films deposited from mixtures of silane in helium at high deposition ratesJournal of Non-Crystalline Solids, 1993
- Electron time of flight experiment under high electric field in a-Si: HSolid State Communications, 1992
- Narrow Band-Gap a-Si:H with Improved Minority Carrier-Transport Prepared by Chemical AnnealingJapanese Journal of Applied Physics, 1991
- The defect density in amorphous siliconPhilosophical Magazine Part B, 1989
- Hole carrier drift-mobility measurements in a-Si: H, and the shape of the valence-band tailPhilosophical Magazine Part B, 1988
- Electron drift mobility in amorphous Si: HPhilosophical Magazine Part B, 1986
- Characteristics of Schottky Barrier Diodes in P-doped Amorphous Si: HJapanese Journal of Applied Physics, 1982
- Evidence for Exponential Band Tails in Amorphous Silicon HydridePhysical Review Letters, 1981
- Electronic Transport in Amorphous Silicon FilmsPhysical Review Letters, 1970