Deposition of transparent and conducting indium-tin-oxide films by the r.f.-superimposed DC sputtering technology
- 1 October 1999
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 354 (1-2) , 100-105
- https://doi.org/10.1016/s0040-6090(99)00558-1
Abstract
No abstract availableThis publication has 20 references indexed in Scilit:
- Dependence of oxygen flow on optical and electrical properties of DC-magnetron sputtered ITO filmsThin Solid Films, 1998
- Transparent and conducting ZnO(:Al) films deposited by simultaneous RF- and DC-excitation of a magnetronThin Solid Films, 1998
- Characterization of a magnetron sputtering discharge with simultaneous RF- and DC-excitation of the plasma for the deposition of transparent and conductive ZnO:Al-filmsSurface and Coatings Technology, 1998
- Preparation of Ta/Mo structure by using RF-Dc coupled magnetron sputteringThin Solid Films, 1998
- Structure and properties of tin-doped indium oxide thin films prepared by reactive electron-beam evaporation with a zone-confining arrangementJournal of Applied Physics, 1996
- Physical properties of pyrolytically sprayed tin-doped indium oxide coatingsThin Solid Films, 1991
- Electrical and optical properties of indium tin oxide thin films prepared on low-temperature substrates by rf magnetron sputtering under an applied external magnetic fieldJournal of Applied Physics, 1988
- Optical properties of transparent and heat-reflecting indium tin oxide films: Refinements of a model for ionized impurity scatteringJournal of Applied Physics, 1986
- Deposition of transparent heat-reflecting coatings of metal oxides using reactive planar magnetron sputtering of a metal and/or alloyThin Solid Films, 1981
- Hf-sputtered indium oxide films doped with tinApplied Physics A, 1978