Polarity-dependent rejuvenation of ferroelectric properties of integrated SrBi2Ta2O9 capacitors by electrical stressing
- 17 January 2000
- journal article
- conference paper
- Published by AIP Publishing in Applied Physics Letters
- Vol. 76 (3) , 324-326
- https://doi.org/10.1063/1.125764
Abstract
The electric-field-induced rejuvenation behavior of the degraded ferroelectric properties of integrated capacitors was investigated. Integration processes, especially plasma-enhanced chemical vapor deposition of the passivation layers, generate hydrogen ions and electrons which act as domain pinning centers and a source of a negative internal electric field. Domain pinning was found to reduce the remanent polarization and internal field that induces an imprint to the positive bias direction. Alternating current cyclings with peak voltages of +/−6 V rejuvenated the degraded ferroelectric performance of the capacitors. Cycling with a negative bias was more effective in fixing the damage than was a positive bias. Baking at 125 °C again degraded the rejuvenated ferroelectric performance. The degree of re-degradation was also dependent on the polarity of the rejuvenating bias. The polarity-dependent behavior of rejuvenation was explained on the basis of a negative-internal-field model due to preferential capture of electrons from the plasma at the top electrodes.
Keywords
This publication has 7 references indexed in Scilit:
- Degradation behavior in the remnant polarization of SrBi2Ta2O9 thin films by hydrogen annealing and its recovery by postannealingApplied Physics Letters, 1999
- Studies of hydrogen-induced degradation processes in SrBi2Ta2O9 ferroelectric film-based capacitorsApplied Physics Letters, 1999
- Compositional dependence of electrical characteristics of SrBi2(Ta1−xNbx)2O9 thin-film capacitorsJournal of Applied Physics, 1998
- Evaluation of imprint in fully integrated (La,Sr)CoO3/Pb(Nb,Zr,Ti)O3/(La,Sr)CoO3 ferroelectric capacitorsJournal of Applied Physics, 1998
- Electrode dependence of hydrogen-induced degradation in ferroelectric Pb(Zr,Ti)O3 and SrBi2Ta2O9 thin filmsApplied Physics Letters, 1997
- Relationships among ferroelectric fatigue, electronic charge trapping, defect-dipoles, and oxygen vacancies in perovskite oxidesIntegrated Ferroelectrics, 1997
- Characterisation of the fatigued state of ferroelectric PZT thin-film capacitorsMicroelectronic Engineering, 1995