Direct preparation of γ-Fe2O3 thin film recording media by reactive r.f. sputtering technique
- 1 September 1986
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 143 (1) , 73-82
- https://doi.org/10.1016/0040-6090(86)90148-3
Abstract
No abstract availableKeywords
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