Sputtering of metals in the presence of reactive gases
- 1 April 1977
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 42 (2) , 185-191
- https://doi.org/10.1016/0040-6090(77)90416-3
Abstract
No abstract availableThis publication has 21 references indexed in Scilit:
- Mechanism of rf reactive sputteringJournal of Applied Physics, 1975
- Argon ion etching in a reactive gasJournal of Materials Science, 1973
- Effect of oxygen on the sputtering of aluminium targets bombarded with argon ionsInternational Journal of Mass Spectrometry and Ion Physics, 1973
- Reactive sputtering of metals in oxidizing atmospheresThin Solid Films, 1973
- Sputtering of Chemisorbed Nitrogen with Ar+Journal of Vacuum Science and Technology, 1971
- The mechanism of reactive sputteringJournal of Materials Science, 1968
- Effect of Oxygen on the rf-Sputtering Rate of SiO2Journal of Vacuum Science and Technology, 1968
- Surface Cleaning by Cathode SputteringJournal of Applied Physics, 1960
- Sputtering Yields for Normally Incident-Ion Bombardment at Low Ion EnergyPhysical Review B, 1957
- Color in Films of Sputtered TinJournal of the Optical Society of America, 1933