Determination of refractive-index profiles by a combination of visible and infrared ellipsometry measurements

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Abstract
Model inhomogeneous silicon oxynitride films were produced by ion-beam sputtering and characterized by ellipsometry in the visible and infrared ranges. These films exhibit strong intentional gradients of the refractive index that cannot be considered linear. A discrete description of the index profile with a few layers or a continuous description with a polynomial are examined; regressions by the use of measurements in the visible only or in the total spectral range (visible and infrared) are performed. Acquisition of data in an extended range is found to be a guarantee of the reliability of the calculated index profiles.