X-ray photoelectron spectroscopic characterization of ultra-thin silicon oxide films on a Mo(100) surface
- 1 December 1992
- journal article
- Published by Elsevier in Surface Science
- Vol. 279 (1-2) , 119-126
- https://doi.org/10.1016/0039-6028(92)90748-u
Abstract
No abstract availableKeywords
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