Ti-Nx compounds deposited at low temperature: General aspects of their phase composition
- 1 September 1985
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 131 (3-4) , 303-311
- https://doi.org/10.1016/0040-6090(85)90151-8
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Mechanisms of reactive sputtering of titanium nitride and titanium carbide II: Morphology and structureThin Solid Films, 1983
- Theory of getter pump evaluation. Sticking coefficients of common gases on continuously deposited getter filmsVacuum, 1983
- Optical properties of CVD-coated TiN, ZrN and HfNSolar Energy Materials, 1983
- Ion-beam-assisted deposition of thin filmsApplied Optics, 1983
- The plasma-assisted chemical vapour deposition of TiC, TiN and TiCxN1−xThin Solid Films, 1981
- Stimulation of sorption on metal films by means of radiation defectsThin Solid Films, 1981
- Deposition of Ti-N compounds by thermionically assisted triode reactive ion platingThin Solid Films, 1980
- Synthesis of titanium nitrides by activated reactive evaporationThin Solid Films, 1980
- Hard decorative TiN coatings by ion platingThin Solid Films, 1977
- The Electrical Properties of Thin Films of TiNx and TiCxZeitschrift für Naturforschung A, 1975