Plasma enhanced chemical vapor deposition silicon oxynitride optimized for application in integrated optics
- 1 April 1999
- journal article
- Published by Elsevier in Sensors and Actuators A: Physical
- Vol. 74 (1-3) , 9-12
- https://doi.org/10.1016/s0924-4247(98)00325-2
Abstract
No abstract availableKeywords
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