Influence of rapid thermal annealing processes on the properties of SiN :H films deposited by the electron cyclotron resonance method
- 1 May 1998
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 227-230, 523-527
- https://doi.org/10.1016/s0022-3093(98)00092-1
Abstract
No abstract availableKeywords
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