Micropatterning of SiO2 film using organosilicon nanocluster as a precursor
- 1 October 1999
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 354 (1-2) , 13-18
- https://doi.org/10.1016/s0040-6090(99)00560-x
Abstract
No abstract availableKeywords
Funding Information
- Ministry of Education, Culture, Sports, Science and Technology
- Tokuyama Science Foundation
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