The interaction of WF6 with Si(100); thermal and photon induced reactions
- 31 December 1988
- journal article
- Published by Elsevier in Surface Science
- Vol. 201 (1-2) , 47-58
- https://doi.org/10.1016/0039-6028(88)90596-1
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Catalytic growth rate enhancement of electron beam deposited iron filmsApplied Physics Letters, 1987
- Electron beam stimulated chemical vapor deposition of patterned tungsten films on Si(100)Applied Physics Letters, 1986
- Studies of adsorption and electron-induced dissociation of Fe(CO)5 on Si(100)Surface Science, 1986
- Reactions of XeF2 chemisorbed on Si(111) 7×7Applied Physics Letters, 1985
- Selective Low Pressure Chemical Vapor Deposition of TungstenJournal of the Electrochemical Society, 1984
- Photoeffects on the fluorination of silicon. II. Kinetics of the initial response to lightThe Journal of Chemical Physics, 1984
- Photoeffects on the fluorination of silicon. I. Influence of doping on steady-state phenomenaThe Journal of Chemical Physics, 1983
- Laser Microchemistry and its Application to Electron-Device FabricationAnnual Review of Physical Chemistry, 1983
- Gaseous products from the reaction of XeF2 with siliconJournal of Applied Physics, 1983
- Refractory silicides for integrated circuitsJournal of Vacuum Science and Technology, 1980