A method for determining the mass thickness of thin films using electron probe microanalysis
- 1 January 1987
- Vol. 9 (4) , 145-155
- https://doi.org/10.1002/sca.4950090403
Abstract
No abstract availableFunding Information
- Österreichische Nationalbank (1011/05257/245/71462)
This publication has 13 references indexed in Scilit:
- A Further Improvement in the Gaussian ϕ(ϱ) Approach for Matrix Correction in Quantitative Electron Probe MicroanalysisScanning, 1986
- A study of electron backscattering of thin films on substratesScanning, 1986
- A new method for determining the thickness and composition of thin layers by electron probe microanalysisCrystal Research and Technology, 1985
- The performance of the modified Φ(ϱz) approach as compared to the love and scott, ruste and standard ZAF correction procedures in quantitative electron probe microanalysisScanning, 1984
- A correction procedure for characteristic fluorescence encountered in microprobe analysis near phase boundariesScanning, 1983
- Measurements of the electron backscattering coefficient for quantitative EPMA in the energy range of 4 to 40 keVPhysica Status Solidi (a), 1979
- A characteristic fluorescence correction for electron-probe microanalysis of thin coatingsJournal of Physics D: Applied Physics, 1979
- The prospects for an improved absorption correction in electron probe microanalysisJournal of Physics D: Applied Physics, 1974
- Quantitative Electron Microprobe Analysis of Thin Films on SubstratesIBM Journal of Research and Development, 1974
- Coating thickness measurement by electron probe microanalysisBritish Journal of Applied Physics, 1963