Measurements of interface state density in partially- and fully-depleted silicon-on-insulator MOSFETs by a high-low-frequency transconductance method
- 31 August 1992
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 35 (8) , 1031-1035
- https://doi.org/10.1016/0038-1101(92)90001-s
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Determination of interface state density in small-geometry MOSFETs by high-low-frequency transconductance methodIEEE Electron Device Letters, 1991
- Analysis of the charge pumping technique and its application for the evaluation of MOSFET degradationIEEE Transactions on Electron Devices, 1989
- Static and dynamic transconductance of MOSFETsIEEE Transactions on Electron Devices, 1989
- Analytical modeling of transfer admittance in small MOSFETs and application to interface state characterisationSolid-State Electronics, 1988
- The use of multiple oxygen implants for fabrication of bipolar silicon-on-insulator integrated circuitsIEEE Transactions on Nuclear Science, 1988
- Static and dynamic transconductance model for depletion-mode transistors: a new characterization method for silicon-on-insulator materialsIEEE Electron Device Letters, 1988
- An analytical model of conductance and transconductance for enhanced-mode mosfetsPhysica Status Solidi (a), 1986
- A reliable approach to charge-pumping measurements in MOS transistorsIEEE Transactions on Electron Devices, 1984