Ellipsometric characterization of hydrogen-rich oxynitride films
- 1 October 1993
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 233 (1) , 227-230
- https://doi.org/10.1016/0040-6090(93)90096-8
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Optical characterization of oxynitride films in the visible-ultraviolet rangeApplied Physics A, 1993
- Fitting refractive-index data with the Sellmeier dispersion formulaApplied Optics, 1984
- Determination of optical constants of thin film coating materials based on inverse synthesisApplied Optics, 1983
- Nondestructive analysis of Si3N4/SiO2/Si structures using spectroscopic ellipsometryJournal of Applied Physics, 1981
- Dielectric function of Si-SiO2 and Si-Si3N4 mixturesJournal of Applied Physics, 1979
- The determination of interface layers by spectroscopic ellipsometryThin Solid Films, 1979
- Berechnung verschiedener physikalischer Konstanten von heterogenen Substanzen. I. Dielektrizitätskonstanten und Leitfähigkeiten der Mischkörper aus isotropen SubstanzenAnnalen der Physik, 1935