Deposition and etching of tantalum oxide films in atomic layer epitaxy process

This publication has 5 references indexed in Scilit:

• Layered tantalum-aluminum oxide films deposited by atomic layer epitaxy
  Thin Solid Films, 1993
• Chemical sensitivity of an ISFET with Ta2O5 membrane in strong acid and alkaline solutions
  Sensors and Actuators B: Chemical, 1991
• Promising storage capacitor structures with thin Ta/sub 2/O/sub 5/ film for low-power high-density DRAMs
  IEEE Transactions on Electron Devices, 1990
• Characterization of surface exchange reactions used to grow compound films
  Applied Physics Letters, 1981
• Beiträge zur Chemie der Elemente Niob und Tantal. XXV. Das Gleichgewicht Ta₂O₅ + 3 TaCl₅g = 5 TaOCl₃g
  Zeitschrift für anorganische und allgemeine Chemie, 1960