Mirror electron microscopy applied to the determination of the total electron reflection coefficient at a metallic surface

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Abstract
It is shown that the intensity of the electronic current backscattered from the surface is the convolution product of the total reflection coefficient by the energy distribution of the incident beam. A deconvolution method has been used to obtain this coefficient and this method is based on a rigorous inversion of the convolution integral operator. Numerical tests show that this method is not very sensitive to the experimental random noise. Results are given for W(100), Cu(100), and O/Cu(100) surfaces, and these are correlated with earlier measurements.