In situ scanning tunneling microscopy studies of the evolution of surface morphology and microstructure in epitaxial TiN(001) grown by ultra-high-vacuum reactive magnetron sputtering
- 31 October 1997
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 94-95, 403-408
- https://doi.org/10.1016/s0257-8972(97)00444-1
Abstract
No abstract availableKeywords
This publication has 25 references indexed in Scilit:
- Dry cutting performance of HSS twist drills coated with improved TiAlNSurface and Coatings Technology, 1997
- High-flux low-energy (≂20 eV) N+2 ion irradiation during TiN deposition by reactive magnetron sputtering: Effects on microstructure and preferred orientationJournal of Applied Physics, 1995
- Low-energy (5<E i<100 eV), high-brightness, ultrahigh vacuum ion source for primary ion beam deposition: Applications for Al and GeJournal of Vacuum Science & Technology A, 1995
- EXPERIMENTAL OBSERVATIONS OF SELF-AFFINE SCALING AND KINETIC ROUGHENING AT SUB-MICRON LENGTHSCALESInternational Journal of Modern Physics B, 1995
- Surface Morphology during Multilayer Epitaxial Growth of Ge(001)Physical Review Letters, 1995
- The roughening of metal surfacesSurface Science Reports, 1994
- Effect of anode bias on plasma confinement in direct current magnetron dischargesJournal of Vacuum Science & Technology A, 1994
- Growth of epitaxial TiN films deposited on MgO(100) by reactive magnetron sputtering: The role of low-energy ion irradiation during depositionJournal of Crystal Growth, 1988
- Electrostatic Probe Measurements in the Glow Discharge Plasma of a D. C. Magnetron Sputtering SystemContributions to Plasma Physics, 1988
- Charge Transfer in Oxygen, Nitrogen, and Nitric OxideThe Journal of Chemical Physics, 1963