High throughput ion implantation systems in western electric

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Abstract
Within Western Electric, a number of high throughput systems have been developed to meet the differing needs of high voltage and low voltage ion implantation applications. The PR-500 is a general purpose 500 kV machine which provides typical target currents of 0.5 ma of the common dopants and throughputs of 100 75-mm wafers/hour. The PR-200 is a 200 kV machine with typical target currents of 2.5 ma P, As, and Sb, and 1.0 ma B, and wafer throughputs of 150/hour. The PR-30 is a 30 kV single-species machine which can perform predeposition implants at rates of up to 450 wafers/hour. Typical PR-30 target currents are 5 ma P, As, and Sb. and 1.5 ma B. Each of these systems makes use of a common family of high current ion sources, and a rotating disk mechanical scanning system which permits a minimum implant time for 1 % uniformity of two seconds per wafer.

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