Enhanced diffusion phenomena during rapid thermal annealing of preamorphized boron-implanted silicon
- 16 June 1986
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 95 (2) , 589-598
- https://doi.org/10.1002/pssa.2210950228
Abstract
No abstract availableKeywords
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