Anomalous Enhanced Diffusion and Electrical Activation of Boron in Silicon After Rapid Isothermal Annealing
- 16 February 1986
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 93 (2) , 549-557
- https://doi.org/10.1002/pssa.2210930219
Abstract
No abstract availableKeywords
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