SOI: materials to systems
- 24 December 2002
- proceedings article
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- Vol. 5, 3-10
- https://doi.org/10.1109/iedm.1996.553028
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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- ‘SIMOX’ (Separation by Ion Implantation of Oxygen): a Technology for high-temperature silicon sensorsSensors and Actuators A: Physical, 1990
- Formation of SiO2 Films by Oxygen-Ion BombardmentJapanese Journal of Applied Physics, 1966