The influence of process parameters on the properties of chromium-nitrogen coating by d.c. reactive sputtering at room temperature
- 31 December 1994
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 68-69, 157-165
- https://doi.org/10.1016/0257-8972(94)90154-6
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Properties of chromium nitride coatings deposited by cathodic arc evaporationSurface and Coatings Technology, 1993
- Reactive unbalanced magnetron sputtering of the nitrides of Ti, Zr, Hf, Cr, Mo, Ti-Al, Ti-Zr and Ti-Al-VSurface and Coatings Technology, 1993
- Control of reactive d.c. planar magnetron sputtering of chromium nitrideSurface and Coatings Technology, 1992
- A comparison of the corrosion behaviour and hardness of steel samples (100Cr6) coated with titanium nitride and chromium nitride by different institutions using different deposition techniquesMaterials Science and Engineering: A, 1991
- A new sputter process for hard coating of large machine parts at low temperaturesMaterials Science and Engineering: A, 1991
- Structure and mechanical properties of reactively sputtered chromium nitridesSurface and Coatings Technology, 1991
- Compositional, microstructural and morphological effects on the mechanical and tribological properties of chromium nitrogen filmsSurface and Coatings Technology, 1990
- The influence of microstructure on stress state of sputter deposited chromium nitride filmsJournal of Vacuum Science & Technology A, 1990
- Stress state of chromium nitride films deposited by reactive direct current planar magnetron sputteringJournal of Vacuum Science & Technology A, 1990
- Charakterisierung von aufgestäubten Chromnitridschichten / Characterization of Sputter Deposited Chromium Nitride CoatingsPractical Metallography, 1989