Effect of spatial localisation of dopant atoms on the confining potential and electron subband structure in δ-doped GaAs:Si
- 31 December 1992
- journal article
- Published by Elsevier in Surface Science
- Vol. 267 (1-3) , 61-64
- https://doi.org/10.1016/0039-6028(92)91089-t
Abstract
No abstract availableKeywords
This publication has 17 references indexed in Scilit:
- Effect of spatial localization of dopant atoms on the spacing of electron subbands in δ-doped GaAs:SiApplied Physics Letters, 1991
- Electronic properties of a pulse-doped GaAs structure grown by organometallic vapor phase epitaxyApplied Physics Letters, 1990
- Post-growth diffusion of Si in delta -doped GaAs grown by MBESemiconductor Science and Technology, 1989
- Incorporation of Si in δ-doped GaAs studied by local vibrational mode spectroscopyApplied Physics Letters, 1989
- Subband physics for a “realistic” δ-doping layerSurface Science, 1988
- Effect of substrate temperature on migration of Si in planar-doped GaAsApplied Physics Letters, 1988
- Ultra-thin-channelled GaAs MESFET with double-δ-doped layersElectronics Letters, 1988
- Fundamental studies and device application of ?-doping in GaAs Layers and in AlxGa1?xAs/GaAs heterostructuresApplied Physics A, 1988
- Inelastic light scattering by electronic excitations in semiconductor heterostructuresIEEE Journal of Quantum Electronics, 1986
- Schottky-barrier tunneling spectroscopy for the electronic subbands of a δ-doping layerSolid State Communications, 1986