Determination of energy density distribution and capture cross-section of interface states in the metal-nitride-oxide-semiconductor (MNOS) structure
- 31 March 1982
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 25 (3) , 219-226
- https://doi.org/10.1016/0038-1101(82)90111-3
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
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- Interface states in MOS structures with 20–40 Å thick SiO2 films on nondegenerate SiSolid-State Electronics, 1972
- The Si-SiO2Interface - Electrical Properties as Determined by the Metal-Insulator-Silicon Conductance TechniqueBell System Technical Journal, 1967
- Surface states at steam-grown silicon-silicon dioxide interfacesIEEE Transactions on Electron Devices, 1966
- FREQUENCY DEPENDENCE OF THE IMPEDANCE OF DISTRIBUTED SURFACE STATES IN MOS STRUCTURESApplied Physics Letters, 1966