10-nm resolution electron-beam lithography
- 15 June 1984
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 55 (12) , 4430-4435
- https://doi.org/10.1063/1.333015
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
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- Contact lithography at 157 nm with an F2 excimer laserJournal of Vacuum Science & Technology B, 1983
- Electron beam lithography from 20 to 120 keV with a high quality beamJournal of Vacuum Science & Technology B, 1983
- 10-nm linewidth electron beam lithography on GaAsApplied Physics Letters, 1983
- Ultra-small metal particle arrays produced by high resolution electron-beam lithographyJournal of Applied Physics, 1982
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- Resolution Limits of PMMA Resist for Exposure with 50 kV ElectronsJournal of the Electrochemical Society, 1981
- Profile control by reactive sputter etchingJournal of Vacuum Science and Technology, 1978