Kinetics and crystallization studies by in situ X-ray diffraction of the oxidation of chemically vapour deposited SiC
- 1 September 1991
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 204 (1) , 217-227
- https://doi.org/10.1016/0040-6090(91)90507-t
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
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