Diffusion of nickel in silicon below 475 °C
- 1 December 1978
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 55 (3) , 473-482
- https://doi.org/10.1016/0040-6090(78)90164-5
Abstract
No abstract availableThis publication has 21 references indexed in Scilit:
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