High-rate deposition of YBa2Cu3O7−x films by hot cluster epitaxy

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Abstract
The growth rate and crystallinity of YBa 2 Cu 3 O 7−x (YBCO)films were investigated in connection with the cluster size and the growth mode in order to clarify the high-rate deposition of high-quality epitaxialfilms from clusters in the plasma flash evaporation method. The films were deposited from clusters that were not accelerated by bias voltage but were self-activated in a thermal plasma. With increasing cluster size, the growth rate increased drastically at the point of the growth mode transition from spiral to two-dimensional cluster nucleus growth. After the transition, the film was still well epitaxial and have the minimum value of the full width at half maximum of the (005) x-ray rocking curve ( FWHM rc ). A 1-μm-thick, nonspiral growth,monolayer smooth epitaxialYBCOfilm was successfully deposited at a growth rate of 16 nm/s. FWHM rc for the films was less than 0.14°. It was revealed experimentally that the deposition from “hot” clusters with large sticking probability onto a high-temperature substrate is highly effective for the deposition of high-quality films at a high rate.

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