Preparation and properties of Al2O3 films by d.c. and r.f. magnetron sputtering
- 15 October 1982
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 96 (3) , 265-270
- https://doi.org/10.1016/0040-6090(82)90251-6
Abstract
No abstract availableKeywords
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- Substrate floating potential characteristics in planar magnetron and ht sputtering systemsVacuum, 1980
- Direct current reactive sputtering of aluminiumThin Solid Films, 1978
- Reactive film preparationThin Solid Films, 1976