Simulation of optical lithography and inspection
- 1 March 1992
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 17 (1-4) , 377-384
- https://doi.org/10.1016/0167-9317(92)90077-5
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
- Simulation of defects in 3-dimensional resist profiles in optical lithographyMicroelectronic Engineering, 1991
- Modeling and simulation of a deep-ultraviolet acid hardening resistJournal of Vacuum Science & Technology B, 1990
- Investigation of the exposure and bake of a positive acting resist with chemical amplificationPublished by SPIE-Intl Soc Optical Eng ,1990
- A ballistic deposition model for films evaporated over topographyThin Solid Films, 1990
- Modeling of optical alignment and metrology schemes used in integrated circuit manufacturingPublished by SPIE-Intl Soc Optical Eng ,1990
- Process control with chemical amplification resists using deep ultraviolet and x-ray radiationJournal of Vacuum Science & Technology B, 1988
- Calculation Of Light Scatter From Structures On Silicon SurfacesPublished by SPIE-Intl Soc Optical Eng ,1987
- Two-Dimensional Simulation of Photolithography on Reflective Stepped SubstrateIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 1987
- A Three-Dimensional Photoresist Imaging Process Simulator for Strong Standing-Wave Effect EnvironmentIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 1987
- Improving resolution in photolithography with a phase-shifting maskIEEE Transactions on Electron Devices, 1982