High-density uniformly aligned silicon nanotip arrays and their enhanced field emission characteristics
- 31 January 2003
- journal article
- Published by Elsevier in Solid State Communications
- Vol. 125 (3-4) , 185-188
- https://doi.org/10.1016/s0038-1098(02)00720-2
Abstract
No abstract availableKeywords
This publication has 23 references indexed in Scilit:
- Field-emission properties of multihead silicon cone arrays coated with cesiumApplied Physics Letters, 2002
- Silicon tip arrays with nanocomposite film for electron field emission applicationsMaterials Science and Engineering: C, 2002
- Photon assisted field emission from a silicon emitterSolid-State Electronics, 2001
- Analysis of a photon assisted field emission deviceApplied Physics Letters, 2000
- Application of field emitter arrays to microwave power amplifiersIEEE Transactions on Plasma Science, 2000
- Fabrication of silicon cones and pillars using rough metal films as plasma etching masksApplied Physics Letters, 1999
- Fabrication of size-controlled 10-nm scale Si pillars using metal clusters as formation nucleiMicroelectronic Engineering, 1998
- Fabrication of field emission display prototype based on Si field emission arrays with diamond coatingJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997
- Highly anisotropic room-temperature sub-half-micron Si reactive ion etching using fluorine only containing gasesMicroelectronic Engineering, 1995
- Fabrication of high aspect ratio silicon pillars of <10 nm diameterApplied Physics Letters, 1993