Effect of low-temperature SiGe interlayer on the growth of relaxed SiGe
- 26 May 2000
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 213 (3) , 308-311
- https://doi.org/10.1016/s0022-0248(00)00348-1
Abstract
No abstract availableKeywords
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