Surface mobility in n/sup +/ and p/sup +/ doped polysilicon gate PMOS transistors
- 1 May 1989
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 36 (5) , 963-968
- https://doi.org/10.1109/16.299679
Abstract
No abstract availableKeywords
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