Photoresponse in amorphous semiconductors as dark conductivity varies
- 15 October 1987
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 62 (8) , 3380-3387
- https://doi.org/10.1063/1.339300
Abstract
The variations in conductivity, under illumination of amorphous semiconductors, is examined as a function of the dark Fermi level (EF) using a simple, generally accurate approach which eliminates the need for a complete numerical solution of equations covering generation, recombination, and trapping. The enhanced photoconduction on doping is readily quantified along with the reduced photosensitivity (total to dark conductivity ratio). Various models can be more readily assessed. Predictions are examined in detail for the often used exponential gap state model. The associated Rose model result for the intensity dependence is seen to be an asymptotic limit which becomes less applicable as dark conductivity increases. Temperature dependence is also examined. Emphasis is on doping, but contrasts are also drawn between the effects of a homogeneous and inhomogeneous shift in dark activation energy. The reduction in the exponent γ for the intensity dependence is far more pronounced when external fields modify the dark conductivity.This publication has 20 references indexed in Scilit:
- Steady-state photoconductivity in a-Si:H prepared by d.c. magnetron methodsPhilosophical Magazine Part B, 1986
- Photo-field effect in amorphous silicon thin-film transistorsJournal of Applied Physics, 1986
- Photoconductivity of lightly boron doped a-Si:HJournal of Non-Crystalline Solids, 1985
- The photofield effect in a-Si: H thin film MOS transistors Theory and measurementPhilosophical Magazine Part B, 1985
- Dependence of photoconductivity on the dark Fermi level position in amorphous silicon alloysApplied Physics Letters, 1984
- Steady-state photoconductivity and recombination process in sputtered hydrogenated amorphous siliconPhysical Review B, 1984
- Effects of deep localized-state distribution on photoconductive properties in amorphous siliconJournal of Non-Crystalline Solids, 1983
- Photoinduced metastable surface effects in boron-doped hydrogenated amorphous silicon filmsJournal of Applied Physics, 1983
- Fermi-level effects in-Si:H photoconductivityPhysical Review B, 1983
- The effects of band bending on the photoconductivity in a-Si:HPhysica B+C, 1983