The Influence of Target-Substrate Bias on Pulsed Laser Deposited Yba₂Cu₃0_7-6

This publication has 10 references indexed in Scilit:

• I n s i t u processing of epitaxial Y-Ba-Cu-O high T c superconducting films on (100) SrTiO3 and (100) YS-ZrO2 substrates at 500–650 °C
  Applied Physics Letters, 1989
• Inductive measurements of critical current density in superconducting thin films
  IEEE Transactions on Magnetics, 1989
• Generation of high-energy atomic beams in laser-superconducting target interactions
  Applied Physics Letters, 1989
• Epitaxial growth of YBa2Cu3O7−x thin films by a laser evaporation process
  Applied Physics Letters, 1988
• Nature of the pulsed laser process for the deposition of high T c superconducting thin films
  Applied Physics Letters, 1988
• As-deposited high T c and J c superconducting thin films made at low temperatures
  Applied Physics Letters, 1988
• Deposition of superconducting Y-Ba-Cu-O films at 400 °C without post-annealing
  Applied Physics Letters, 1988
• Observation of two distinct components during pulsed laser deposition of high T c superconducting films
  Applied Physics Letters, 1988
• Binary collision cascade prediction of critical ion-to-atom arrival ratio in the production of thin films with reduced intrinsic stress
  Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987
• Thin film annealing by ion bombardment
  Thin Solid Films, 1980