In-situ characterization of II/VI molecular beam epitaxy growth using reflection high-energy electron diffraction oscillations
- 2 March 1994
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 137 (1-2) , 187-194
- https://doi.org/10.1016/0022-0248(94)91270-x
Abstract
No abstract availableKeywords
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