Nanoscopy: nanometre defect analysis by computer aided 3D optical imaging

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Abstract
The combined developments of sub-micrometre integration in IC technology and high speed data handling in digital image processing have provided the means of introducing a new concept of 'vision' on a nanometre scale,which we call 'nanoscopy'. Using advanced optical imaging techniques under computer control and processing, high resolution image synthesis of certain objects can be carried out so long as they can be defined by separable functions. Measurements of position two to three orders of magnitude below the diffraction limit can be made. Nanoscopy is illustrated by three techniques applied to defect analysis in semiconductor materials. Nanoscopy techniques are non-contact, non-destructive, and give large amounts of quantified information concerning the 3D distribution of defects. Because they give nanometre resolution within a relatively large field of tens to hundreds of micrometres, the location of position or of particular features is simplified, which can be a problem with super resolution techniques such as electron microscopy and scanning tunnelling microscopy.