Reversal of Step Roughness on Ge-Covered Vicinal Si(001)
- 23 January 1995
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 74 (4) , 574-577
- https://doi.org/10.1103/physrevlett.74.574
Abstract
The influence of Ge on the equilibrium step morphologies of vicinal Si(001) has been investigated quantitatively using scanning tunneling microscopy. As the Ge coverage increases, the relative roughness of the two types of steps on the surface reverses. Physically, the accompanying evolving () reconstruction modifies the kink energetics by introducing a new type of kink, and confines step meandering. The energies associated with these new kinks and the dependence of the step energies on are extracted.
Keywords
This publication has 16 references indexed in Scilit:
- Surface stress and interface formationPhysical Review B, 1993
- 2×n surface structure of SiGe layers deposited on Si(100)Applied Physics Letters, 1992
- Layer-by-layer growth of germanium on Si(100): strain-induced morphology and the influence of surfactantsUltramicroscopy, 1992
- Missing dimers and strain relief in Ge films on Si(100)Physical Review B, 1992
- Scanning tunneling microscopy studies of the growth process of Ge on Si(001)Journal of Crystal Growth, 1991
- Dislocation-free Stranski-Krastanow growth of Ge on Si(100)Physical Review Letters, 1990
- Heteroepitaxial growth of Ge films on the Si(100)-2×1 surfaceJournal of Applied Physics, 1985
- Si(001) Dimer Structure Observed with Scanning Tunneling MicroscopyPhysical Review Letters, 1985
- The influence of reconstruction on epitaxial growth: Ge on Si(100)-(2 × 1) and Si(111)-(7 × 7)Surface Science, 1985
- Structure and Adsorption Characteristics of Clean Surfaces of Germanium and SiliconThe Journal of Chemical Physics, 1959