Formation of 15nm scale Coulomb blockade structures in silicon by electron beam lithography with a bilayer resist process
- 1 November 2004
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 22 (6) , 3115-3118
- https://doi.org/10.1116/1.1825012
Abstract
No abstract availableKeywords
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