Automatic control in microelectronics manufacturing: Practices, challenges, and possibilities
- 1 November 2000
- journal article
- review article
- Published by Elsevier in Automatica
- Vol. 36 (11) , 1567-1603
- https://doi.org/10.1016/s0005-1098(00)00084-4
Abstract
No abstract availableKeywords
This publication has 82 references indexed in Scilit:
- Run by run control of chemical-mechanical polishingIEEE Transactions on Components, Packaging, and Manufacturing Technology: Part C, 1996
- Sensor systems for real-time feedback control of reactive ion etchingJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- Application of neural networks to plasma etch end point detectionJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- Modeling and control of microelectronics materials processingComputers & Chemical Engineering, 1995
- Time series modeling of reactive ion etching using neural networksIEEE Transactions on Semiconductor Manufacturing, 1995
- MMST manufacturing technology-hardware, sensors, and processesIEEE Transactions on Semiconductor Manufacturing, 1994
- Modeling the Wafer Temperature Profile in a Multiwafer LPCVD FurnaceJournal of the Electrochemical Society, 1994
- Simultaneous in situ measurement of film thickness and temperature by using multiple wavelengths pyrometric interferometry (MWPI)IEEE Transactions on Semiconductor Manufacturing, 1993
- Modeling and scale-up of multiwafer LPCVD reactorsAIChE Journal, 1992
- Rapid thermal processing uniformity using multivariable control of a circularly symmetric 3 zone lampIEEE Transactions on Semiconductor Manufacturing, 1992