Oxidation behaviour of double layers of TiSi2 on polycrystalline silicon
- 1 June 1984
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 116 (4) , 383-390
- https://doi.org/10.1016/0040-6090(84)90119-6
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
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