Low stress silicon stencil masks for sub-100 nm ion beam lithography
- 30 April 1990
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 11 (1-4) , 449-452
- https://doi.org/10.1016/0167-9317(90)90149-n
Abstract
No abstract availableKeywords
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- Magnetically enhanced reactive ion etching of silicon in bromine plasmasJournal of Vacuum Science & Technology B, 1988
- Ion projection lithography for sub-micron modification of materialsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987
- The thermomechanical stability of ion beam masksJournal of Vacuum Science & Technology B, 1987
- Prospects for printing very large scale integrated circuits with masked ion beam lithographyJournal of Vacuum Science & Technology A, 1986
- Silicon nitride stencil masks for high resolution ion lithography proximity printingJournal of Vacuum Science & Technology B, 1983