Impact ionization rate in GaAs
- 15 February 1994
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 49 (7) , 4494-4500
- https://doi.org/10.1103/physrevb.49.4494
Abstract
The impact ionization rate and its orientation dependence in k space is calculated for GaAs. The numerical results indicate a strong correlation to the band structure. The use of a q-dependent screening function for the Coulomb interaction between conduction and valence electrons is found to be essential. Comparison with recent results for Si, GaAs shows a harder threshold behavior. A simple fit formula is presented for easy calculation of the direction-dependent transition rate. With only the band structure as input the numerical results are closely reproduced in an arbitrary direction in the Brillouin zone.Keywords
This publication has 30 references indexed in Scilit:
- Thresholds of impact ionization in semiconductorsJournal of Applied Physics, 1992
- Impact ionization in semiconductors: Effects of high electric fields and high scattering ratesPhysical Review B, 1992
- k dependence of the impact ionization transition rate in bulk InAs, GaAs, and GeJournal of Applied Physics, 1992
- Impact-ionization theory consistent with a realistic band structure of siliconPhysical Review B, 1992
- The determination of impact ionization coefficients in (100) gallium arsenide using avalanche noise and photocurrent multiplication measurementsIEEE Transactions on Electron Devices, 1985
- Temperature dependence of impact ionisation rates in GaAs between 20° and 200°CElectronics Letters, 1979
- The band structure dependence of impact ionization by hot carriers in semiconductors: GaAsSolid-State Electronics, 1978
- Observation of Electronic Band-Structure Effects on Impact Ionization by Temperature TuningPhysical Review Letters, 1977
- Orientation Dependence of Free-Carrier Impact Ionization in Semiconductors: GaAsPhysical Review Letters, 1977
- Electron drift velocity in siliconPhysical Review B, 1975