Interface modifications for improving the adhesion of a-C:H films to metals
- 1 April 1988
- journal article
- Published by Springer Nature in Journal of Materials Research
- Vol. 3 (2) , 214-217
- https://doi.org/10.1557/jmr.1988.0214
Abstract
The adhesion of diamondlike hard carbon films to silicide forming metals was improved by using an interfacial silicon film several atomic layers thick. The use of thicker (> 10nm) silicon layers results in a decrease in the adhesion, probably due to a degradation of the structural integrity by excessive silicide formation.Keywords
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