Ion beam deposition of i n s i t u superconducting Y-Ba-Cu-O films
- 22 January 1990
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 56 (4) , 394-396
- https://doi.org/10.1063/1.103292
Abstract
Oriented superconducting YBa2Cu3O7 thin films were deposited on yttria‐stabilized zirconia substrates by ion beam sputtering of a nonstoichiometric oxide target. The films exhibited zero‐resistance critical temperatures as high as 80.5 K without post‐deposition anneals. Both the deposition rate and the c lattice parameter data displayed two distinct regimes of dependence on the beam power of the ion source. Low‐power sputtering yielded films with large c dimensions and low Tc’s. Higher power sputtering produced a continuous decrease in the c lattice parameter and an increase in critical temperatures.Keywords
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