Three-dimensional pattern transfer and nanolithography: modified soft molding
- 30 July 2002
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 81 (6) , 1011-1013
- https://doi.org/10.1063/1.1498149
Abstract
One-step transfer of molded three-dimensional polymer structures into underlying substrate is reported. The one-step transfer is made possible by a molding technique presented here in the form of modified soft molding. Formation of a desired three-dimensional structure in a polymer film by this method, followed by one-step reactive ion etching, is utilized for the transfer. The technique is also shown to be effective in transferring sub-100-nm features.Keywords
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