A study of hillock formation on AlTa alloy films for interconnections of TFT-LCDs
- 1 December 1995
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 270 (1-2) , 450-455
- https://doi.org/10.1016/0040-6090(96)80076-9
Abstract
No abstract availableThis publication has 17 references indexed in Scilit:
- In situ scanning electron microscope observation of hillock and whisker growth on Al–Ta alloy films for interconnections of thin film transistor–liquid crystal displaysJournal of Vacuum Science & Technology A, 1994
- The effect of grain orientation on the relaxation of thermomechanical stress and hillock growth in AI-1%Si conductor layers on silicon substratesJournal of Electronic Materials, 1993
- Study of the thermal behaviour of thin aluminium alloy filmsThin Solid Films, 1992
- Annealing behavior of Al–Y alloy film for interconnection conductor in microelectronic devicesJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1991
- A transmission electron microscopy study of hillocks in thin aluminum filmsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1991
- Thermally induced hillock formation in Al–Cu filmsJournal of Materials Research, 1989
- Measurement and Interpretation of stress in aluminum-based metallization as a function of thermal historyIEEE Transactions on Electron Devices, 1987
- Hillock growth kinetics in thin Pb-In-Au filmsPhilosophical Magazine A, 1986
- Hillock formation in lead films by grain boundary slidingPhilosophical Magazine A, 1980
- Hillock growth in thin filmsJournal of Applied Physics, 1974