Local silicon molecular beam epitaxy with microshadow masks
- 3 May 1993
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 62 (18) , 2221-2223
- https://doi.org/10.1063/1.109422
Abstract
No abstract availableKeywords
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- Formation of Uniform Solid-Phase Epitaxial CoSi2 Films by Patterning MethodJapanese Journal of Applied Physics, 1985
- Silicon Cleaning with Hydrogen Peroxide Solutions: A High Energy Electron Diffraction and Auger Electron Spectroscopy StudyJournal of the Electrochemical Society, 1972