Ellipsometry study of the adhesion of dielectric thin films on polymer substrates
- 1 October 1993
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 233 (1-2) , 256-259
- https://doi.org/10.1016/0040-6090(93)90102-u
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- An IR phase-modulated ellipsometer using a Fourier transform spectrometer for in situ applicationsThin Solid Films, 1993
- Infrared ellipsometry study of the oxidation mechanisms of hydrogenated amorphous siliconSurface Science, 1992
- In situ study of the growth of hydrogenated amorphous silicon by infrared ellipsometryApplied Physics Letters, 1991
- An in situ infrared study of the room temperature oxidation of silicon with atomic and molecular oxygenApplied Surface Science, 1989
- Oxygen-bonding environments in glow-discharge-deposited amorphous silicon-hydrogen alloy filmsPhysical Review B, 1983